Cathay Advanced Materials Limited is recognized for its unique capabilities in the fabrication of sputtering target (Metal, Oxide, Alloy, Boride, Carbide, Nitride, Fluoride, Silicide, Sulfide) and evaporation coating materials for customers in industries, materials dealers, university and research institutes around the world at competitive price.
Serve as the raw materials for the sputter deposition of a variety of thin films and coatings used in the semiconductor, photovoltaic, flat panel display, optics, wear and decorative coatings, and other industries.
Our core process technologies used in thin film coating materials and sputtering targets manufacturing include: Casting (Vacuum Induction melting, cold crucible levitation melting, electron beam melting, plasma arc melting and vacuum refining), rolling, forging (hot / cold), pressing (cold, hot, uniaxial or isotropic), sintering, spraying (plasma, wire). CAM runs all these process technologies, including cutting, milling, sawing, grinding, etc.
1.) Oxide sputtering target:
Nb2O5, Nb2Ox, Ga2O3, V2O5, V2O3, VO2, VOx, ZrO2 doped with Ti, WO3, WO2.9, WO3/MoO3, HfO2, MgO, MgO/Cr, Al2O3, Al2O3/Cr, In2O3, Indium Tin Oxide, ITO (In2O3-SnO2), In2O3/CaO, ZnO, Al2O3 doped ZnO (AZO), IZO (Indium Zinc Oxide, 90 wt% In2O3 / 10 wt% ZnO), In2O3/CaO ICO, Li2O/ZnO LZO, Ga2O3 doped ZnO (GZO), IGZO, ZnO2/TiO2, ZnO2/ZrO2, ZnO/Li, ZnO/Mg, ZnO/LiCl, ZnO/ZnS, La0.67Sr0.33MnO3 (LSMO), ZrO2-Y2O3 stabilized (YSZ), SnO2, Sb2O3 doped SnO2 (ATO), SnO2/F FTO, ZrO2+Ti, ZrO2+Zr, ZrO2+SiO2, Bi2O3, Bi2O3/Dy2O3/Fe2O3, Cr2O3, MoO, MoO3, NiO, NiO/Li, SiO, Cr-SiO, SiO2, TiO, TiO2, TiOx, TiO2/Nb2O5, Ti2O3, Ti3O5, CuO/Al2O3, Cu2O, Sb2O3, BaO, CaO, Fe2O3, Fe3O4, PbO, PbTiO3, PbZrTiO3, PbZrO3, PbZr0.52Ti0.48O3, PbZr0.2Ti0.8O3, Pb1.2ZrO3, LiNbO3, SrO, FeTiO3, SrTiO3, SrRuO3, BaTiO3, PbTiO3, SrZrO3, BaZrO3, SrBaTiO3, PZT (Plumbum Zirconate Titanate), LaNiO3, InGaZnO, CuInO2, LaAl2O3, CGO, Y3Fe5O12 YIG, Y2Ce1Fe5O12, Gd3Ga5O12, Tm3Fe5O12 TIG, Ce2Bi0.5Y0.5Fe5O12, Li6.4La3Zr1.7W0.3O12, Li7La3Zr2O12, HfO2, ZrO2, LiCoO2, Li3PO4, Cd2SnO4, BiFeO3, Yb2Hf2O7, Yb6HfO11, Yb4Hf3O12, Yb2SiO5, LiMn2O4, Li4Ti5O12, LiLaTi2O6, Mg2SiO4, MgFePO4, Bi2WO6, RuO2, MgMnSiO4, MgFeSiO4, NdNiO3, BaFe12O19, SiO2/Cr2O3, BaZr0.8Y0.2O3, SiO2/In2O3/ZnO, Ba0.5Sr0.5TiO3, MgCa(CO3)2, PbZr0.6Ti0.4O3, Li2WO4, Ba0.6Sr0.4TiO3, Ba0.8Sr0.2TiO3, NiCoO, BaZrO3/Y2O3/YBa2Cu3O7, Bi1.5Zn1.0Nb1.5O7, LaAlO3, LaMnO3 BZN, Bi1.1FeO3, Ba(Zr0.8Y0.2)O3, Ce2.5Y0.5Fe5O12, Yb2HfO2, Yb6HfO11, Yb2Hf2O7, Yb2O3/HfO2, BaPbO3, InMnO3, SmFeO3, SmNiO3, Bi1.05FeO3, SrFe12O19, CdTeO3, TeO2, CdO, Co3O4, Bi4(TiO4)3, LiFePO4, CoFe2O4, BaHfO3, SrHfO3
2.) (Boride, Carbide, Nitride, Fluoride, Silicide, Silicate, Sulfide, Telluride, stannate) sputtering target
AlB2, LaB6, SmB6, GdB6, ZrB2, CrB2, TiB2, HfB2, Mo2B5, TaB2, NbB2, W2B, WB, VB2, TiB, Boron
Cr2AlC, Ti2AlC, V2AlC, TiC, SiC, WC, WC-Co, WC-Ni, B4C, TaC, NbC, Cr3C2, HfC, Mo2C, VC, TeC, ZrC, Cr/Si/SiC, CrB2/SiC, Fe3C, Co2C, Ti3AlC2
Si3N4, AlN, BN, BN/SiC mixture, CrN, HfN, TaN, NbN, ZrN, TiN, VN
LaF3, CeF3, NdF3, YF3, NaF, KF, BaF2, AlF3, LiF, CaF2, SrF3, SrF2, MgF2
CoSi2, Mo5Si3, MoSi2, Ta5Si3, TaSi2, TaSi, WSi2, WSi, Nb5Si3, NbSi2, CrSi2, Cr3Si, HfSi2, TiSi2, ZrSi2
Ti5Si3, ZrSi2, WSi2, VSi2, V3Si, NiSi, YSi2, GeSi, HfSiO4, ZrSiO4
CdS, ZnS, FeS2, Cu2S, ZnS/Mn, In2S3, Sb2S3, PbS, MoS2, MoS2/Ti, MoS2/Ni, MoS2/W, SnS, SnS2, TaS2, WS2, In2S3, GeS, GeS2, Ag2S, Y2S3
CdSe, In2Se3, GeSe, GeSe2, GeSe4, GeSe6, CuSe, Cu2Se, SnSe, SeSe2, SiSe, ZnSe, Bi2Se3, WSe2, As2Se3, Ag2Se, MoSe2, HgSe, Sb2Se3
Zn2SnO4, Cd2SnO4, ZnTe, Bi2Te3, In2Te3, ZnSe, As2Te3, GeAs3Te5, GaAs, InAs
Ag2Te, Cr2Te3, GeTe, CdTe, InTe, PbTe, Bi2Te3, Ge2Sb2Te5, Cr2Ge2Te6, Fe3GeTe2, MnTe, SiTe, SnTe, WTe2, MgB2, MgB2/Mg, MoTe2, Sb2Te3, AlFe2B2, SeTe, HgTe
3.) Metal sputtering target:
Magnesium Mg, Calcium Ca, Strontium Sr, Barium Ba
Titanium Ti, Zirconium Zr, Hafnium Hf, Vanadium V, Niobium Nb, Tantalum Ta, Chromium Cr, Molybdenum Mo, Tungsten W, Manganese Mn, Rhenium Re,
Iron Fe, Ruthenium Ru, Osmium Os, Cobalt Co, Rhodium Rh, Iridium Ir, Nickel Ni, Palladium Pd, Platinum Pt,
Copper Cu, Silver Ag, Gold Au, Zinc Zn, Cadmium Cd
Boron B, Aluminum Al, Indium In, Carbon C, Graphite, Silicon Si, Germanium Ge, Tin Sn, Lead Pb, Antimony Sb, Bismuth Bi, Selenium Se, Tellurium Te
4.) Alloy sputtering target:
Ag/Al, Ag/Cu, Ag/La, Ag/Lu, Ag/Mg, Al/Ca, Al/Ce, Al/B, Al/Sm, Ag/Sn, Al/Ag, Al/Cr, Al/Cu, Al/Cu/Zn, Al/Zn, Al/Fe, Al/Dy, Al/Tm, Al/Er, Al/Gd, Al/Li, Al/Mg, Li/Mg, Al/Mg/Si, Al/Mn, Al/Ni, Al/Sc, Al/Si, Al/Si/Cu, Al/Si/Y, Al/Sm, Al/Ta, Al/Ti, Al/Ti/Ta, Al/Mo, Al/Nd, Al/V, Al/Y, Al/Yb, Al/W, Al/Cr/Nb/Si/Ti/V, Al/Cr/Mo/Ta/Ti/Zr, Bi/Ag, Bi/Sn, Bi/Pb, Bi/Te/Se/In, Cd/Sn, La/Mn, Ba/Al, Ca/Al, Ce/Ag, Ce/Cu, Ce/Gd, Ce/Sm, Ce/Ti, Co/Al, Co/B, Co/Cr, Co/Cr/Al, Co/Cr/Fe, Co/Fe, Co/Fe/V, Co/Fe/Mn/Si, Co/Fe/Si/B, Co/Fe/B, Co/Fe/Gd, Co/Fe/Cr, Co/Ni/Fe/Cr/Al, Co/Gd, Co/Mn/Si, Co/Ni, Co/Ni/Cr, Co/Nb/Zr, Co/Ti/Sb/Fe, Co/Tb, Co/V, Co/Si, Co/Zr, Co/Zn/Mn, Cr/Al, Cr/B, Cr/Cu, Cr/Mn, Cr/Ni, Cr/Si, Zr/Si, Cr/SiO, Cr/V, Cr/W, Cu/Al, Cu/Ag, Cu/Fe, Cu/Cr, Cu/Al/Ni, Cu/B, Cu/Be, Cu/Ga, Cu/Ge, C/W, C/Ag, Cu/In, Cu/In/Ga/Se, Cu/Zn, Cu/Zn/Al, Cu/Zr/Ti, Cu/Si, Cu/Mo, Cu/Mn/Ti, Cu/Ti, Cu/Ni, Cu/NiO, Cu/Ni/Zn, Cu/Li, Cu/W, Dy/Fe, Dy/Co, Dy/Fe/Co, Fe/Al, Fe/B, Fe/Cr, Fe/Cr/Al, Fe/Co, Fe/Co/B, Fe/Co/Gd, Fe/Gd, Fe/Hf, Fe/Mn, Fe/Ni, Fe/Si, Fe/Si/Al, Fe/Zr, Gd/Ce, Gd/Fe, Gd/Fe/Co, Gd/Er/Si, Gd/Tb, Gd/Ti , Ho/Cu, Hf/Fe, Hf/Zr, Hf/Y, Hf2Al5, HfAl3, In/Sb, In/Sn, In/Zn, Fe/Ge, Pb/Bi, LaB6, La/Al, La/Ni, Mg/Al, Mg/Ca, Mg/Dy, Mg/Gd, Mg/In, Mg/Nd, Mg/Ni, Mg/Nd/Zr/Y, Mg/Sc, Mg/Sm, Mg/Si/Bi, Mg/Y, Mg/Y/Al/Zr, Mg/Zr, Mg/Zn, Mg/Zn/Ca, Mn/Co, Mn/Ga, Mn/Ge, Mn/Co/Ge, Mn/V/Si/Co, Mo/Co/Si, Mn/Al, Mn/Fe, Mn/Ni, Mn/Sn, Mn/Ti/Al, Mo/Na, Mo/Nb, Mo/Cr, Mg2Ni, Ta/Mo, Mo/Si, Nb/Cr/Ti, NbAl3, Nb3Al, Nb2Al, Nb/Si, Nb/Ti, Nb/Zr, Nb/Ta/Ti/V, Nd/Ag, Nd/Fe/B, Ni/Al, Ni/Al/Cr/Hf/Si, Ni/Ce, Ni/La, Ni/Cu, Ni/Cr, Ni/Cr/Al, Ni/Cr/Si, Ni/Ga, Ni/Fe, Ni/Mn, Ni/Ti, Ni/W, Ni/C, Ni/V, Ni/V/Zr, Ni/Yb, Ni2Yb, Ni2MnAl, Co2MnSi, Ni3Yb, Ni3Ti, Ni/Yb, Ni/Zr, Ni/Co, Ni/Re, Ni/Co/Cr/Al/Y/Hf/Si, Sc/Ni, Sc/Zr, Sm/Co, Sm/Fe, Sm2Fe17, Sm/Zr, Sn/Mn, Sn/Sb/Ta, Si/Ti, Ta/Al, Ti/Al, Ti/Ag, Ti/Al/Cr, Ti/Al/Nb, Ti/Al/W, Ti/Al/Cr/Nb, Ti2Al, Ti/Al/Y, Ti/Al/V, Ti/Co, Ti/Hf, Ti/Cr, Ti/Cr/V, Ti/Cr/Mn, Ti/Ni, Ti/Si, Ti/Zr, Ti/Zr/Cr/Mn, Ti/Zr/V, Ti/Pd, Ti/Mo, Ti/Mn, Ti/Mo/Zr/Fe, Ti/V, Ti/V/Cr, Ti/W, Ti2MnAl, Tb/Dy, Tb/Dy/Fe, Tb/Fe, Tb/Fe/Co, Tb/Gd/Fe/Co, Si/Al, Si/Al/W, Si/Cu, Si/Er, SiGe, Si/Ge, Si/Zr, Ge/Si, Ge/Ni/Ti/Cr/Si, V/Al, V/B, V/C, V/Co, V/Cr, V/Cu, V/Fe, V/Mo, V/Ni, V/Ti, V/Ti/Cr, WAl4, Re3Al, W/Cr, W/Ti, W/Si, W/Si/C, W/Ta, Y/Al, Y/Ti, Y/Zr, Y/Zr/Mg, Y/Zr/Si, Cu6Sn5, Cu/Zn/Sn/Se, Zn/Al, Zn/Mg, Zn/Fe, Zn/Fe/Al, Zn/Sn, Zn/Ti, Zn/Al/Mg, Zr2Si, Zr/Al, Zr/Ce, Zr/Co/Ce, Zr/Cu, Zr/Fe, Zr/Cu/Al, Zr/Gd, Zr/Si, Zr/Ti, Zr/Ni, Zr/Y, Zr/Mn/Fe/Al, W/Re, W/Re/HfC, Ti3Al, TiAl3, TiAl6V4, Co2MnGa, In/Sb, Co2MnSi, Nb3Sn, Nb3Ge, Zr2Cu, Zircaloy-4, SmFe11Ti, CeCu6, B/Ni/Co
5.) Thin film photovoltaic coating materials
Cadmium Sulfide CdS, Copper Sulphide CuS, Cadmium Telluride CdTe, Lead Telluride PbTe, Mercury Telluride HgTe, Indium Telluride In2Te3, Antimony Telluride Sb2Te3, Bismuth Telluride Bi2Te3, Gallium Telluride Ga2Te3, Tin Telluride SnTe
Zinc Telluride ZnTe, CuInGaSe, In2Se3, Ga2Se3, CuInSe2, CuInS2, Zinc Stannate (Zn2SnO4), Cadmium Stannate (Cd2SnO4), SnO2, SnCl4, ZnO, Molybdenum, Indium, ZnS, ZnSe, InSb, InAs, In2S3, CuGa, Cu2S, Cu2Se.
